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RADIION TECH CO LTD

Overview
  • Total Patents
    30
About

RADIION TECH CO LTD has a total of 30 patent applications. Its first patent ever was published in 2002. It filed its patents most often in Republic of Korea. Its main competitors in its focus markets electrical machinery and energy, semiconductors and chemical engineering are ADAPTIVE PLASMA TECH CORP, SPP TECH CO LTD and ADVANCED MICRO-FABRICATION EQUIPMENT INC.

Patent filings in countries

World map showing RADIION TECH CO LTDs patent filings in countries
# Country Total Patents
#1 Republic of Korea 30

Patent filings per year

Chart showing RADIION TECH CO LTDs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Chung Sang Gon 23
#2 Lee Kyung Ho 22
#3 Kim Hyoung Won 12
#4 Shin You Shik 4
#5 Park Hye Jung 4
#6 Gu Ja Bung 2
#7 Lee Seong Hui 2
#8 Lim Deok Gyu 2
#9 Jung Sang Gon 1
#10 Kim Dong Hyun 1

Latest patents

Publication Filing date Title
KR20090025518A Method of etching a wafer
KR20080104807A Apparatus for plasma treatment
KR20080097551A Substrate support assembly and substrate processing apparatus having the same
KR100844150B1 Plasma processing apparatus and method
KR20080061051A Method of etching a wafer
KR100734016B1 Receiving substrate and plasma processing apparatus having the same
KR20070099742A Plasma processing apparatus
KR100723378B1 Plasma processing apparatus
KR20070066390A Plasma processing apparatus and plasma processing method
KR20070063946A Plasma processing method and apparatus
KR100716177B1 Matching device and plasma processing apparatus
KR100683253B1 Matching device and plasma processing apparatus
KR20070052112A Power supplying device and plasma processing apparatus including the same
KR20070047545A Plasma processing apparatus
KR20070045513A Baffle and plasma etching device having same
KR20070045512A A substrate support member and plasma processing apparatus including the same
KR100683252B1 Power supplying device and plasma processing apparatus including the same
KR20070036274A Upper electrode assembly and plasma processing apparatus
KR100683255B1 Plasma processing apparatus and exhausting device
KR20070012131A Plasma processing apparatus and exhausting plate