| # | Country | Total Patents | |
|---|---|---|---|
| #1 | United States | 12 | |
| #2 | WIPO (World Intellectual Property Organization) | 1 |
| # | Industry | |
|---|---|---|
| #1 | Optics | |
| #2 | Semiconductors | |
| #3 | Micro-structure and nano-technology | |
| #4 | Machines | |
| #5 | Electrical machinery and energy |
| # | Name | Total Patents |
|---|---|---|
| #1 | Ebihara Akimitsu | 13 |
| #2 | Yuan Bausan | 3 |
| #3 | Lee Martin E | 2 |
| #4 | Takahashi Masato | 1 |
| #5 | Fukai Kunitomo | 1 |
| #6 | Hsin Yi-Ping | 1 |
| #7 | Hashimoto Hideyuki | 1 |
| Publication | Filing date | Title |
|---|---|---|
| US2012127445A1 | Isolation system for an optical element of an exposure apparatus | |
| US2010164326A1 | Motor device, apparatus and driving method for rotor | |
| US2007206170A1 | Exposure apparatus and making method thereof | |
| US2007109522A1 | Stage device and coordinate correction method for the same, exposure apparatus, and device manufacturing method |