ASML HOLLAND N V has a total of 24 patent applications. Its first patent ever was published in 2002. It filed its patents most often in China. Its main competitors in its focus markets optics, chemical engineering and micro-structure and nano-technology are ICHINOSE GO, KANAYA YUHO and NAGASAKA HIROYUKI.
# | Country | Total Patents | |
---|---|---|---|
#1 | China | 24 |
# | Industry | |
---|---|---|
#1 | Optics | |
#2 | Chemical engineering | |
#3 | Micro-structure and nano-technology | |
#4 | Machines | |
#5 | Semiconductors | |
#6 | Machine tools | |
#7 | Engines, pumps and turbines | |
#8 | Textiles and paper |
# | Name | Total Patents |
---|---|---|
#1 | Vanengensheno K | 1 |
#2 | Libuze A | 1 |
#3 | Nawarokelun R | 1 |
#4 | Fritz K F Best J J Konsoliney | 1 |
#5 | Holuns G-J | 1 |
#6 | Simons G | 1 |
#7 | Dirihis M M T M | 1 |
#8 | Vancovink M N J | 1 |
#9 | Joinink A B | 1 |
#10 | Henricu Johannes Stevens Lucas | 1 |
Publication | Filing date | Title |
---|---|---|
CN1477449A | Method for mfg. photoetching device and component |