QMAT INC has a total of 33 patent applications. It decreased the IP activity by 83.0%. Its first patent ever was published in 2014. It filed its patents most often in United States, EPO (European Patent Office) and WIPO (World Intellectual Property Organization). Its main competitors in its focus markets semiconductors, surface technology and coating and machines are WAFER WORKS EPITAXIAL CORP, GLOBAL WAFERS CO LTD and GLOBALWAFERS CO LTD.
# | Country | Total Patents | |
---|---|---|---|
#1 | United States | 10 | |
#2 | EPO (European Patent Office) | 6 | |
#3 | WIPO (World Intellectual Property Organization) | 6 | |
#4 | China | 5 | |
#5 | Republic of Korea | 4 | |
#6 | Taiwan | 2 |
# | Industry | |
---|---|---|
#1 | Semiconductors | |
#2 | Surface technology and coating | |
#3 | Machines | |
#4 | Electrical machinery and energy |
# | Technology | |
---|---|---|
#1 | Semiconductor devices | |
#2 | Single-crystal-growth | |
#3 | Unspecified technologies | |
#4 | Coating metallic material | |
#5 | Electric discharge tubes |
# | Name | Total Patents |
---|---|---|
#1 | Henley Francois J | 33 |
#2 | Kang Sien | 14 |
#3 | Li Minghang | 8 |
#4 | Zhong Mingyu | 8 |
#5 | Lamm Albert | 6 |
#6 | Lee Dong Seung | 1 |
Publication | Filing date | Title |
---|---|---|
WO2019217976A2 | Patterning on layer transferred templates | |
TW201836168A | Micro-light emitting diode (led) fabrication by layer transfer | |
US2018040764A1 | Seed wafer for GaN thickening using gas- or liquid-phase epitaxy | |
EP3485505A1 | Method of a donor substrate undergoing reclamation | |
WO2018011731A1 | Method of a donor substrate undergoing reclamation | |
US2018019169A1 | Backing substrate stabilizing donor substrate for implant or reclamation | |
US2018033609A1 | Removal of non-cleaved/non-transferred material from donor substrate | |
WO2016205751A1 | Bond and release layer transfer process | |
WO2014113503A1 | Techniques for forming optoelectronic devices |