|
US2013207238A1
|
|
Block co-polymer photoresist
|
|
US2013207053A1
|
|
Synthesis, capping and dispersion of nanocrystals
|
|
US2011056841A1
|
|
System and method for direct conversion of solar energy to chemical energy
|
|
US2011214284A1
|
|
Highly conductive composites
|
|
WO2008008275A2
|
|
Resists for photolithography
|
|
US2009081594A1
|
|
Applications of semiconductor nano-sized particles for photolithography
|
|
WO2004053938A2
|
|
Programmable photolithographic mask based on nano-sized semiconductor particles
|
|
US6879376B2
|
|
Method and apparatus for exposing photoresists using programmable masks
|
|
US7050155B2
|
|
Advanced exposure techniques for programmable lithography
|
|
US2002061472A1
|
|
Three-dimensional lithography by multiple two-dimensional pattern projection
|
|
US6291110B1
|
|
Methods for transferring a two-dimensional programmable exposure pattern for photolithography
|
