Learn more

S & AMP STECH CO LTD

Overview
  • Total Patents
    18
About

S & AMP STECH CO LTD has a total of 18 patent applications. Its first patent ever was published in 2010. It filed its patents most often in Republic of Korea. Its main competitors in its focus markets semiconductors, optics and surface technology and coating are CHANG CHING-YU, ORTHOGONAL INC and ALLIED MATERIAL TECHNOLOGY CORP.

Patent filings in countries

World map showing S & AMP STECH CO LTDs patent filings in countries
# Country Total Patents
#1 Republic of Korea 18

Patent filings per year

Chart showing S & AMP STECH CO LTDs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Nam Kee Soo 18
#2 Yang Sin Ju 6
#3 Park Youn Soo 5
#4 Seo Sung Min 4
#5 Yang Chul Kyu 4
#6 Kang Eun Tae 3
#7 Geum Du Hun 3
#8 Kim Sung Soo 3
#9 Cha Han Sun 3
#10 Kim Dong Geun 3

Latest patents

Publication Filing date Title
KR20120007953A Device for removing resist and mask blank and method for manufacturing omask blank
KR20110127055A Device for forming resist, photomask blank, and method for manufacturing photomask blank
KR20110127587A Thinner half-tone phase shift blankmask and manufacturing method of the same
KR20120005576A Uv cleaner of substrate for photomask blank and cleanning method
KR20110118539A Blankmask, photomask and manutacturing method of the same
KR20110136319A Photomask blank and photomask
KR20110129757A Blankmask and photomask for critical dimension control and its manufacturing
KR20110127571A Substrate for photomask blank, photomask blank and photomask
KR20110127044A Substrate for photomask and photomask blank
KR20110125405A Photomask blank and photomask
KR20110125403A Photomask, method for manufacturing photomask and method for forming pattern
KR20110120785A Reflective type euv blankmask, photomask and its manufacturing method
KR20110115058A Photomask blank, photomask and method of forming patttern
KR20110084816A Multi-tone photomask blank and method for manufacturing thereof
KR20110105520A A blank mask, a photomask using the same and method of fabricating the same
KR20110085736A The blank mask and photomask and these manufacturing methods
KR20110085737A The blank mask and photomask and these manufacturing methods