POLANYI JOHN C has a total of 12 patent applications. Its first patent ever was published in 1997. It filed its patents most often in United States, Canada and WIPO (World Intellectual Property Organization). Its main competitors in its focus markets semiconductors, optics and micro-structure and nano-technology are INANAMI RYOICHI, S & AMP STECH CO LTD and CHANG CHING-YU.
# | Country | Total Patents | |
---|---|---|---|
#1 | United States | 4 | |
#2 | Canada | 3 | |
#3 | WIPO (World Intellectual Property Organization) | 2 | |
#4 | Australia | 1 | |
#5 | EPO (European Patent Office) | 1 | |
#6 | Hong Kong | 1 |
# | Industry | |
---|---|---|
#1 | Semiconductors | |
#2 | Optics | |
#3 | Micro-structure and nano-technology | |
#4 | Surface technology and coating |
# | Technology | |
---|---|---|
#1 | Semiconductor devices | |
#2 | Nanostructure applications | |
#3 | Photomechanical semiconductor production | |
#4 | Coating metallic material |
# | Name | Total Patents |
---|---|---|
#1 | Polanyi John C | 12 |
#2 | Rogers Duncan | 10 |
#3 | Harikumar Krishnan R | 2 |
#4 | Mcnab Iain Ross | 2 |
#5 | Hofer Werner A | 2 |
Publication | Filing date | Title |
---|---|---|
US2009208672A1 | Method of linear patterning at surfaces | |
US6878417B2 | Method of molecular-scale pattern imprinting at surfaces | |
US6319566B1 | Method of molecular-scale pattern imprinting at surfaces | |
US6156393A | Method of molecular-scale pattern imprinting at surfaces |