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AZ ELECTRONIC MATERIALS JAPAN

Overview
  • Total Patents
    295
About

AZ ELECTRONIC MATERIALS JAPAN has a total of 295 patent applications. Its first patent ever was published in 1997. It filed its patents most often in Republic of Korea, China and Taiwan. Its main competitors in its focus markets optics, semiconductors and macromolecular chemistry and polymers are AZ ELECTRONIC MAT IP JAPAN KK, CHANG CHING-YU and CHEN KUANG-JUNG.

Patent filings per year

Chart showing AZ ELECTRONIC MATERIALS JAPANs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Takano Yusuke 29
#2 Noya Go 22
#3 Dammel Ralph R 19
#4 Takahashi Shuichi 17
#5 Oberlander Joseph E 16
#6 Kobayashi Masakazu 16
#7 Nagahara Tatsuro 15
#8 Hayashi Masanobu 14
#9 Ishikawa Tomonori 14
#10 Akiyama Yasushi 13

Latest patents

Publication Filing date Title
KR20120024530A Liquid drug delivery system and liquid drug container used in the same
TW200928594A Composition for surface anti-reflective coating and method for forming pattern
WO2009008265A1 Composition for forming micropattern and method for forming micropattern using the same
KR20090041933A Photoresist composition for forming a spacer
KR20090041932A Photoresist composition for forming a spacer
KR20090060433A Composition for forming siliceous film and process for producing siliceous film from the same
CN101512737A Composition for forming siliceous film and process for producing siliceous film from the same
KR20050113140A Cleaning composition for a positive or negative photoresist
TW200612209A Fine pattern forming method
TW200613256A Photoactive compounds
TW200609664A Aqueous edge bead remover
TW200613924A A process of imaging a deep ultraviolet photoresist with a top coating and materials thereof
MY145561A A process for imaging a deep ultraviolet photoresist with a top coating and materials thereof
KR20060091866A Positive or negative photoresist stripping composition and stripping method using the same
TW200504878A A phosphorous-containing silazane composition, a phosphorous-containing siliceous film, a phosphorous-containing siliceous filing material, a production method of a siliceous film and semiconductor device
KR20060040686A Photosensitive resin composition
CN1675110A Container for stroring and transporting liquid chemical agent
TWI252383B Photosensitive polysilazane composition, pattern-forming method using it, and calcination method of its coating film
KR20070086644A A method of forming a patterned polysilazane film and a method of burning a radiation sensitive polysilazane coating film
TWI267699B Photo-sensitive compositions