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AZ ELECTRONIC MAT IP JAPAN KK

Overview
  • Total Patents
    71
About

AZ ELECTRONIC MAT IP JAPAN KK has a total of 71 patent applications. Its first patent ever was published in 1999. It filed its patents most often in Taiwan, Republic of Korea and Malaysia. Its main competitors in its focus markets optics, semiconductors and macromolecular chemistry and polymers are AZ ELECTRONIC MATERIALS JAPAN, CHANG CHING-YU and CHEN KUANG-JUNG.

Patent filings in countries

World map showing AZ ELECTRONIC MAT IP JAPAN KKs patent filings in countries
# Country Total Patents
#1 Taiwan 41
#2 Republic of Korea 19
#3 Malaysia 5
#4 China 3
#5 Singapore 2
#6 WIPO (World Intellectual Property Organization) 1

Patent filings per year

Chart showing AZ ELECTRONIC MAT IP JAPAN KKs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Wu Hengpeng 10
#2 Neisser Mark O 9
#3 Tashiro Yuji 8
#4 Yokoyama Daishi 8
#5 Nonaka Toshiaki 8
#6 Kang Wenbing 8
#7 Fuke Takashi 8
#8 Oberlander Joseph E 7
#9 Hishida Aritaka 7
#10 Nagahara Tatsuro 7

Latest patents

Publication Filing date Title
CN103959168A Negative-type photosensitive siloxane composition
WO2012161025A1 Positive photosensitive siloxane composition
KR20140014209A Composition for forming low-refractive-index film, method of forming low-refractive-index film, and low-refractive-index film and antireflective film both formed by the formation method
KR20140000211A Positive photosensitive siloxane composition
TW201111913A Positive-working photoimageable bottom antireflective coating
TW200938950A Fine pattern mask, process for producing the same, and process for forming fine pattern by using the same
TW200928590A Bottom antireflective coating compositions
TW200914996A Photoresist compositions
TW200804469A Treatment of polysilazane waste
TW200739804A Method for producing siliceous film and substrate with siliceous film produced thereby
TW200625406A Photoresist coating solution supply system and method for supplying photoresist coating solution using thereof, and photoresist coating system using thereof
TW201214049A Positive-working photoimageable bottom antireflective coating