| # | Country | Total Patents | |
|---|---|---|---|
| #1 | United States | 5 | |
| #2 | Netherlands | 4 | |
| #3 | United Kingdom | 3 | |
| #4 | WIPO (World Intellectual Property Organization) | 3 | |
| #5 | Germany | 1 |
| # | Industry | |
|---|---|---|
| #1 | Electrical machinery and energy | |
| #2 | Optics | |
| #3 | Surface technology and coating |
| # | Technology | |
|---|---|---|
| #1 | Electric discharge tubes | |
| #2 | Photomechanical semiconductor production | |
| #3 | Coating metallic material |
| # | Name | Total Patents |
|---|---|---|
| #1 | Parker Norman William | 7 |
| #2 | Parker Norman W | 5 |
| #3 | Robinson William P | 4 |
| #4 | Robinson William Preston | 4 |
| #5 | Piccioni Robert L | 2 |
| #6 | Piccioni Robert Libero | 2 |
| #7 | Turnbull William Garfield | 2 |
| #8 | Turnbull William G | 1 |
| #9 | Preston William | 1 |
| Publication | Filing date | Title |
|---|---|---|
| US5035787A | Method for repairing semiconductor masks and reticles | |
| US5165954A | Method for repairing semiconductor masks & reticles | |
| US4929839A | Focused ion beam column | |
| NL8820330A | Mask repair using an optimized focused ion bundle system. | |
| US4789787A | Wien filter design | |
| US4818872A | Integrated charge neutralization and imaging system |