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MEDIA LARIO SRL

Overview
  • Total Patents
    103
  • GoodIP Patent Rank
    124,895
About

MEDIA LARIO SRL has a total of 103 patent applications. Its first patent ever was published in 2000. It filed its patents most often in Netherlands, Germany and Japan. Its main competitors in its focus markets optics, engines, pumps and turbines and medical technology are SOER WOUTER ANTHON, MANN HANS-JUERGEN and ZEISS CARL SEMICONDUCTOR MFG.

Patent filings per year

Chart showing MEDIA LARIO SRLs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Zocchi Fabio 31
#2 Ceglio Natale M 29
#3 Marioni Fabio 17
#4 Levesque Richard 16
#5 Nocerino Giovanni 14
#6 Valenzuela Arnoldo 13
#7 Kools Jacques 12
#8 Banham Robert David 11
#9 Stearns Daniel 11
#10 Valsecchi Giuseppe 11

Latest patents

Publication Filing date Title
WO2020173728A1 Process for manufacturing an athermal low cost telescope based on high precision replication technology, and such telescope
EP3572783A1 Portable device for producing a uniform uv-light beam with small angular size
EP3206862A2 Process for forming an article with a precision surface
US2016007435A1 Systems and methods for synchronous operation of debris-mitigation devices
DE102014006265A1 SN-STEAM EUV-LLP SOURCE SYSTEM FOR EUV LITHOGRAPHY
US2014326904A1 Sn vapor EUV LLP source system for EUV lithography
DE102013002064A1 SOURCE-COLLECTOR MODULES FOR EUV LITHOGRAPHY USING A GIC MIRROR AND AN LPP SOURCE
NL2008647A Evaporative thermal management of grazing incidence collectors for euv lithography.
NL2008216A Thermal management systems, assemblies and methods for grazing incidence collectors for euv lithography.
NL2007264A Source-collector module with gic mirror and tin wire euv lpp target system.
NL2007265A Source-collector module with gic mirror and xenon ice euv lpp target system.
JP2012049526A Source collector module with gic mirror and liquid xenon euv/lpp target system
DE102011108923B3 Three-mirror anastigmat having at least one non-rotationally symmetric mirror
JP2012023036A Gic mirror and source-collector module having tin vapor lpp target system
JP2011238904A Euv mirror module
JP2011222975A Euv radiation collector system with enhanced euv radiation collection
NL2006210A Adjustable clips for grazing-incidence collectors.
JP2011176307A Stress-decoupling device and method for cooled mirror system
DE102010056553A1 Source collector module with GIC mirror and LPP EUV light source
NL2005622A Cooling systems and methods for grazing incidence euv lithography collectors.