WO2020173728A1
|
|
Process for manufacturing an athermal low cost telescope based on high precision replication technology, and such telescope
|
EP3572783A1
|
|
Portable device for producing a uniform uv-light beam with small angular size
|
EP3206862A2
|
|
Process for forming an article with a precision surface
|
US2016007435A1
|
|
Systems and methods for synchronous operation of debris-mitigation devices
|
DE102014006265A1
|
|
SN-STEAM EUV-LLP SOURCE SYSTEM FOR EUV LITHOGRAPHY
|
US2014326904A1
|
|
Sn vapor EUV LLP source system for EUV lithography
|
DE102013002064A1
|
|
SOURCE-COLLECTOR MODULES FOR EUV LITHOGRAPHY USING A GIC MIRROR AND AN LPP SOURCE
|
NL2008647A
|
|
Evaporative thermal management of grazing incidence collectors for euv lithography.
|
NL2008216A
|
|
Thermal management systems, assemblies and methods for grazing incidence collectors for euv lithography.
|
NL2007264A
|
|
Source-collector module with gic mirror and tin wire euv lpp target system.
|
NL2007265A
|
|
Source-collector module with gic mirror and xenon ice euv lpp target system.
|
JP2012049526A
|
|
Source collector module with gic mirror and liquid xenon euv/lpp target system
|
DE102011108923B3
|
|
Three-mirror anastigmat having at least one non-rotationally symmetric mirror
|
JP2012023036A
|
|
Gic mirror and source-collector module having tin vapor lpp target system
|
JP2011238904A
|
|
Euv mirror module
|
JP2011222975A
|
|
Euv radiation collector system with enhanced euv radiation collection
|
NL2006210A
|
|
Adjustable clips for grazing-incidence collectors.
|
JP2011176307A
|
|
Stress-decoupling device and method for cooled mirror system
|
DE102010056553A1
|
|
Source collector module with GIC mirror and LPP EUV light source
|
NL2005622A
|
|
Cooling systems and methods for grazing incidence euv lithography collectors.
|