MATSUMOTO NAOKI has a total of 18 patent applications. Its first patent ever was published in 2004. It filed its patents most often in United States and Japan. Its main competitors in its focus markets electrical machinery and energy, semiconductors and surface technology and coating are THINKON NEW TECH JAPAN CORPORATION, NIHON SHINKOSHINGI CO LTD and NANOFORCE TECHNOLOGIES CORP.
# | Country | Total Patents | |
---|---|---|---|
#1 | United States | 16 | |
#2 | Japan | 2 |
# | Industry | |
---|---|---|
#1 | Electrical machinery and energy | |
#2 | Semiconductors | |
#3 | Surface technology and coating | |
#4 | Measurement | |
#5 | Basic materials chemistry | |
#6 | Chemical engineering | |
#7 | Machine tools |
# | Name | Total Patents |
---|---|---|
#1 | Matsumoto Naoki | 18 |
#2 | Shikata Masafumi | 3 |
#3 | Koshimizu Chishio | 3 |
#4 | Kato Kazuyuki | 3 |
#5 | Hayakawa Yoshinobu | 2 |
#6 | Yoshikawa Jun | 2 |
#7 | Iwata Manabu | 2 |
#8 | Tanaka Satoshi | 2 |
#9 | Hanaoka Hidetoshi | 2 |
#10 | Sasaki Masaru | 2 |
Publication | Filing date | Title |
---|---|---|
JP2017086157A | Ski equipment drying device | |
US2011114261A1 | Plasma processing apparatus | |
US2012012556A1 | Plasma etching apparatus and plasma etching method | |
US2009211708A1 | Plasma processing apparatus | |
US2011039417A1 | Plasma processing apparatus and plasma processing method | |
US2007235426A1 | Plasma processing apparatus and plasma processing method | |
JP2006031128A | Meeting support system |