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TAKOMA TECHNOLOGY CO LTD

Overview
  • Total Patents
    22
  • GoodIP Patent Rank
    192,214
About

TAKOMA TECHNOLOGY CO LTD has a total of 22 patent applications. Its first patent ever was published in 2006. It filed its patents most often in Republic of Korea, Taiwan and WIPO (World Intellectual Property Organization). Its main competitors in its focus markets organic fine chemistry, optics and materials and metallurgy are TAKOMA TECH CO LTD, UTSUMI YOSHIYUKI and ICHIKAWA KOJI.

Patent filings in countries

World map showing TAKOMA TECHNOLOGY CO LTDs patent filings in countries

Patent filings per year

Chart showing TAKOMA TECHNOLOGY CO LTDs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Ryu Mi Sun 9
#2 Cha Hyuk Jin 6
#3 Song Bok Joo 6
#4 Lee Hae Seong 5
#5 Kwon Kyeong Il 5
#6 Yoo Mi Sun 5
#7 Park Jin Kyu 4
#8 Oh Jae Beum 4
#9 Lee Jae Seung 4
#10 Park Sang Hwi 3

Latest patents

Publication Filing date Title
KR20160083637A Photosensitive Resin Composition
TW201522310A Photoinitiator and photosensitive composition including the same
KR101558165B1 Photoininiator and photosensitive composition including the same
KR101457172B1 Photoininiator and photosensitive composition including the same
KR101414547B1 Photoinitiator compounds
CN104276995A High-photosensibility oxime ester photopolymerization initiator and photopolymerization composition containing same
TW201500334A A high sensitivity oxime ester photopolymerization initiator and a photopolymerization composition comprising the same
KR20130085920A New high sensitive a-ketoximester photo compounds and photosensitive composition comprising the same
KR20130128813A Method for manufacturing fullerene using by combustion
KR20130128990A Nanodiamond composition and production method therefor
KR20130126110A By pyrolysis in a continuous manufacturing method of fullerenes
KR20130113210A Fullerene derivatives and preparation thereof
KR20130083188A High sensitive oximester photo compounds and photosensitive composition comprising the same
KR20130003305A Oximino dithiocarbonate compounds and photosensitive composition comprising the same
KR20110056095A Etching composition
KR20090046105A Positive type resist composition
KR20090046101A Fluorene-based derivatives, photo-polymerizable resin composition comprising the same and optical film
KR20090046108A Oxim ester compounds, photosensitive composition comprising the same and usage
KR20080000974A Photosensitive resin composition