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AZ ELECTRONIC MATERIALS MFG CO LTD

Overview
  • Total Patents
    20
  • GoodIP Patent Rank
    231,465
About

AZ ELECTRONIC MATERIALS MFG CO LTD has a total of 20 patent applications. Its first patent ever was published in 2012. It filed its patents most often in Japan. Its main competitors in its focus markets macromolecular chemistry and polymers, basic materials chemistry and optics are AZ ELECTRONIC MATERIALS MFG JAPAN KK, AZ ELECTRONIC MATERIALS LUXEMBOURG SARL and AZ ELECTRONIC MAT (LUXEMBOURG) S À R L.

Patent filings in countries

World map showing AZ ELECTRONIC MATERIALS MFG CO LTDs patent filings in countries
# Country Total Patents
#1 Japan 20

Patent filings per year

Chart showing AZ ELECTRONIC MATERIALS MFG CO LTDs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Tashiro Yuji 5
#2 Georg Pawlowski 5
#3 Nonaka Toshiaki 5
#4 Yokoyama Hiroshi 5
#5 Sekito Takashi 4
#6 Wang Xiaowei 3
#7 Kobayashi Masaichi 3
#8 Yamamoto Kazuma 3
#9 Yoshida Takashi 3
#10 Nagahara Tatsuro 3

Latest patents

Publication Filing date Title
JP2015018226A Negative-type photosensitive composition curable at low temperature
JP2015059144A Coating film-forming composition and coating film-forming method using the same
JP2015010223A Coating composition
JP2014219577A Rinse liquid for lithography and pattern formation method using the same
JP2014211478A Developing or rinsing solution for lithography, and pattern forming method using the same
JP2014178573A Composition for forming overlay film and method for forming resist pattern using the same
JP2014170190A Composition for forming fine resist pattern and pattern forming method using the same
JP2014164177A Composition for forming fine resist pattern and pattern forming method using the same
JP2014160199A Negative type photosensitive siloxane composition
JP2014122306A Composite of metal oxide nanoparticles and a silsesquioxane polymer, method for manufacturing the same, and a composite material manufactured by using the composite
JP2014122309A Composite of silicon oxide nanoparticles and a silsesquioxane polymer, method for manufacturing the same, and a composite material manufactured by using the composite
JP2014119497A Composition for forming overlay film and method for forming resist pattern using the same
JP2014103351A Method for forming siliceous film, and siliceous film formed by the same
JP2014106250A Positive type photosensitive siloxane composition
JP2014094926A Aromatic imide composition and method of producing the same
JP2014077082A Formation method of siliceous dense film
JP2014071424A Composition for forming fine resist pattern and pattern forming method using the same
JP2013257379A Developing or rinsing solution for lithography and pattern forming method using the same
JP2013254109A Overlay film forming composition and resist pattern formation method using same
JP2013162072A Inorganic polysilazane resin