LOOPSTRA ERIK ROELOF has a total of 21 patent applications. Its first patent ever was published in 2004. It filed its patents most often in United States. Its main competitors in its focus markets optics, medical technology and machines are BANINE VADIM YEVGENYEVICH, ASML NETHERLANDS BV and ASM LITHOGRAPHY BV.
# | Country | Total Patents | |
---|---|---|---|
#1 | United States | 21 |
# | Industry | |
---|---|---|
#1 | Optics | |
#2 | Medical technology | |
#3 | Machines | |
#4 | Semiconductors | |
#5 | Electrical machinery and energy | |
#6 | Machine tools | |
#7 | Engines, pumps and turbines |
# | Name | Total Patents |
---|---|---|
#1 | Loopstra Erik Roelof | 21 |
#2 | Swinkels Gerardus Hubertus Petrus Maria | 7 |
#3 | Buurman Erik Petrus | 4 |
#4 | Van Schoot Jan Bernard Plechelmus | 3 |
#5 | Stamm Uwe Bruno Heini | 3 |
#6 | Mulkens Johannes Catharinus Hubertus | 3 |
#7 | Luttikhuis Bernardus Antonius Johannes | 2 |
#8 | Wijckmans Maurice Willem Jozef Etienne | 2 |
#9 | Banine Vadim Yevgenyevich | 2 |
#10 | Pekelder Sven | 2 |
Publication | Filing date | Title |
---|---|---|
US2013141709A1 | Lithographic apparatus, EUV radiation generation apparatus and device manufacturing method | |
US2012026480A1 | Image-Compensating Addressable Electrostatic Chuck System | |
US2008319569A1 | Lithographic projection apparatus and method for controlling a support structure | |
US2007178704A1 | Lithographic apparatus and device manufacturing method for clamping a patterning device |