EULITHA AG has a total of 11 patent applications. Its first patent ever was published in 2003. It filed its patents most often in EPO (European Patent Office), China and United States. Its main competitors in its focus markets optics are MIVA TECH GMBH, KOBAYASHI NAOYUKI and THEODOR DITTMANN.
# | Country | Total Patents | |
---|---|---|---|
#1 | EPO (European Patent Office) | 5 | |
#2 | China | 3 | |
#3 | United States | 2 | |
#4 | WIPO (World Intellectual Property Organization) | 1 |
# | Industry | |
---|---|---|
#1 | Optics |
# | Technology | |
---|---|---|
#1 | Photomechanical semiconductor production | |
#2 | Cameras |
# | Name | Total Patents |
---|---|---|
#1 | Solak Harun | 8 |
#2 | Clube Francis | 6 |
#3 | Dais Christian | 4 |
#4 | Solak Harun H | 3 |
#5 | David Christian | 2 |
Publication | Filing date | Title |
---|---|---|
CN103370654A | Method and apparatus for printing high-resolution two-dimensional periodic patterns | |
CN103080843A | A method and apparatus for printing a periodic pattern with large depth of focus | |
EP2499539A1 | Optimized mask design for fabricating periodic and quasi-periodic patterns | |
US2011199598A1 | Lithographic fabrication of general periodic structures | |
EP1810085A2 | A system and a method for generating periodic and/or quasi-periodic pattern on a sample |