ELECTROMASK INC has a total of 14 patent applications. Its first patent ever was published in 1971. It filed its patents most often in Israel, Japan and United Kingdom. Its main competitors in its focus markets optics, engines, pumps and turbines and mechanical elements are THEODOR DITTMANN, HOSOKAWA KAZUO and SANRITSU KIKAKU KK.
# | Country | Total Patents | |
---|---|---|---|
#1 | Israel | 3 | |
#2 | Japan | 3 | |
#3 | United Kingdom | 2 | |
#4 | United States | 2 | |
#5 | Germany | 1 | |
#6 | France | 1 | |
#7 | Italy | 1 | |
#8 | Netherlands | 1 |
# | Industry | |
---|---|---|
#1 | Optics | |
#2 | Engines, pumps and turbines | |
#3 | Mechanical elements |
# | Technology | |
---|---|---|
#1 | Photomechanical semiconductor production | |
#2 | Cameras | |
#3 | X-ray microscopes | |
#4 | Shafts |
# | Name | Total Patents |
---|---|---|
#1 | Meisenheimer William L | 4 |
#2 | Uiriamu Eru Meisenheimaa | 3 |
#3 | Kurisuchian Ban Pesuki | 3 |
#4 | Fox W | 1 |
#5 | Peski Christian K Van | 1 |
#6 | Christian Peski Van | 1 |
#7 | Van Peski Christian | 1 |
#8 | Hill Edward Grant | 1 |
#9 | Peski Christian Van | 1 |
Publication | Filing date | Title |
---|---|---|
IL59629D0 | Apparatus and process for photoexposing semiconductor wafers | |
IL66762A | Apparatus for use in photo-exposing semiconductor wafers | |
US3980407A | Shutter plate movement | |
US3722996A | Optical pattern generator or repeating projector or the like |