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IE841251L
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Gas plasma reaction for processing semiconductor wafers
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JPS6041230A
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Glass plasma reactor for treating semiconductor wafer
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JPS59229821A
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Plasma reactive ion etching of aluminum and aluminum alloy
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US4526670A
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Automatically loadable multifaceted electrode with load lock mechanism
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GB8334255D0
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Process for depositing dielectric films in a plasma glow discharge
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US4505782A
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Plasma reactive ion etching of aluminum and aluminum alloys
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US4498354A
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Automatic lock for two mode piston pump
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US4353777A
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Selective plasma polysilicon etching
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US4286470A
|
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Clamp-on ultrasonic transducer
|
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US4028155A
|
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Process and material for manufacturing thin film integrated circuits
|
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US4066037A
|
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Apparatus for depositing dielectric films using a glow discharge
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US3962559A
|
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Temperature control circuit and oven
|
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US3952249A
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Edgewise meter assembly
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US4362632A
|
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Gas discharge apparatus
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US3930913A
|
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Process for manufacturing integrated circuits and metallic mesh screens
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US3904529A
|
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Gas discharge apparatus
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US3951709A
|
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Process and material for semiconductor photomask fabrication
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US3951843A
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Fluorocarbon composition for use in plasma removal of photoresist material from semiconductor devices
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US3901071A
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Ultrasonic thickness gauge
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US3854322A
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Caliper gauge
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