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PHYZCHEMIX CORP

Overview
  • Total Patents
    49
About

PHYZCHEMIX CORP has a total of 49 patent applications. Its first patent ever was published in 2005. It filed its patents most often in Japan, Republic of Korea and United States. Its main competitors in its focus markets surface technology and coating, semiconductors and electrical machinery and energy are TORREX EQUIPMENT CORP, ASM GENITECH KOREA LTD and IPS LTD.

Patent filings per year

Chart showing PHYZCHEMIX CORPs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Sakamoto Hitoshi 38
#2 Ogura Ken 19
#3 Hachiman Naoki 13
#4 Tomita Yugo 11
#5 Oyama Naoki 9
#6 Tonegawa Yutaka 8
#7 Kasagi Kazumasa 7
#8 Izumi Kazuya 6
#9 Hashimoto Takuya 6
#10 Osada Masaru 5

Latest patents

Publication Filing date Title
WO2008065908A1 Method for forming group iv metallic element compound film and method for manufacturing semiconductor device
JP2007281524A Method of manufacturing metal film
JP2008118097A Method of forming hafnium coating film, and thin film manufacturing apparatus
JP2007254284A Apparatus and method for producing carbon film
JP2008270251A Method of forming metal-containing group iv thin film, method of manufacturing semiconductor device and micro-device
JP2008269665A Magnetic recording medium, manufacturing method thereof, and method of forming microcrystal metal thin film
JP2008231469A METHOD FOR FORMING SiC, METHOD FOR FORMING FILM, METHOD FOR FORMING SiC ON CHAMBER, METHOD FOR MANUFACTURING SEMICONDUCTOR-MANUFACTURING APPARATUS, APPARATUS FOR FORMING SiC, AND FILM STRUCTURE FORMED WITH THOSE
JP2008208419A Vacuum treatment device and method for detecting its completion point of treatment
JP2007217793A Metal film production device and metal film production method
JP2008184666A Film deposition system
JP2008177512A Apparatus for removing unnecessary object from peripheral edge of substrate, semiconductor manufacturing apparatus and method for removing unnecessary object from peripheral edge of substrate
JP2008177409A Apparatus for consecutively forming film on substrate and transferring the substrate
JP2008150673A Apparatus for producing metal film and method for producing metal film
JP2008147526A Method and apparatus for removing unnecessary material at circumferential edge of wafer, and semiconductor manufacturing apparatus
JP2008127658A Thin film deposition method and thin film deposition device
JP2008127644A Metal film deposition system, and method for cleaning the same
JP2008081755A Treatment apparatus and treatment method
JP2008081754A Thin film production device and thin film production method
JP2008081753A Treatment device and treatment method
JP2008081756A Semiconductor fabrication device