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KLA CORP

Overview
  • Total Patents
    574
  • GoodIP Patent Rank
    2,743
  • Filing trend
    ⇧ 850.0%
About

KLA CORP has a total of 574 patent applications. It increased the IP activity by 850.0%. Its first patent ever was published in 2011. It filed its patents most often in Republic of Korea, WIPO (World Intellectual Property Organization) and United States. Its main competitors in its focus markets measurement, semiconductors and computer technology are KLA TENCOR CORP, KLA-TENCOR CORP and KLA ENCOR CORP.

Patent filings per year

Chart showing KLA CORPs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Fielden John 35
#2 Brauer Bjorn 34
#3 Manassen Amnon 26
#4 Plihal Martin 20
#5 Levinski Vladimir 18
#6 Sears Christopher 16
#7 Volkovich Roie 15
#8 Ghinovker Mark 15
#9 Chuang Yung-Ho Alex 14
#10 Chuang Yung Ho Alex 14

Latest patents

Publication Filing date Title
US2021109030A1 Broadband Light Interferometry for Focal-Map Generation in Photomask Inspection
US2021104388A1 System and method for photomultiplier tube image correction
US2021098223A1 Plasmonic photocathode emitters
US2021097704A1 Multi-imaging mode image alignment
US2021097666A1 Controlling a process for inspection of a specimen
US2021097672A1 Equi-probability defect detection
US2021097671A1 Variation-based segmentation for wafer defect detection
US2021092826A1 Rotating lamp for laser-sustained plasma illumination source
US2021109440A1 System and method for reducing printable defects on extreme ultraviolet pattern masks
US2021098222A1 Light modulated electron source
US2021104034A1 Frequency domain enhancement of low-snr flat residue/stain defects for effective detection
US2021080839A1 System and method for application of harmonic detectivity as a quality indicator for imaging-based overlay measurements
US2021090229A1 Unsupervised Learning-Based Reference Selection for Enhanced Defect Inspection Sensitivity
US2021074567A1 Automatic Teaching of Substrate Handling for Production and Process-Control Tools
WO2021050305A1 Darkfield imaging of grating target structures for overlay measurement
US2021066035A1 Sensor module for scanning electron microscopy applications
US2021050700A1 Laser Closed Power Loop with an Acousto-Optic Modulator for Power Modulation
US2021048756A1 Vacuum actuator containment for molecular contaminant and particle mitigation
US2021035282A1 Method for process monitoring with optical inspections
WO2021016407A1 System and method for error reduction in metrology measurements