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JU SUNG ENGINEERING CO LTD

Overview
  • Total Patents
    213
About

JU SUNG ENGINEERING CO LTD has a total of 213 patent applications. Its first patent ever was published in 1997. It filed its patents most often in Republic of Korea and United States. Its main competitors in its focus markets semiconductors, surface technology and coating and electrical machinery and energy are MEYER BURGER GERMANY GMBH, VNI SOLUTION CO LTD and JUSUNG ENGINEERING CO LTD.

Patent filings in countries

World map showing JU SUNG ENGINEERING CO LTDs patent filings in countries
# Country Total Patents
#1 Republic of Korea 212
#2 United States 1

Patent filings per year

Chart showing JU SUNG ENGINEERING CO LTDs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Hwang Cheol Ju 50
#2 Kwon Gi Cheong 21
#3 Sim Gyeong Sik 21
#4 Byun Hong Sik 16
#5 Kim Hong Seup 13
#6 Han Sun Seok 11
#7 Lee Seung Won 11
#8 Ko Bu Jin 11
#9 Lee Yeong Seok 10
#10 Kim Jeong Sik 10

Latest patents

Publication Filing date Title
KR100478756B1 Toothbrush sterilizer
KR20040017255A apparatus and method for depositing thin film
KR20030023644A Cluster device which having dual structure
KR20030068366A Thin film deposition apparatus having more than one rotatable gas injector and thin film deposition method using the same
KR20040023983A Method of manufacturing SOI substrate
KR20040022530A Lift-assembly for Wafer-process
KR20040022580A Susceptor
KR20040018689A Heater block for Wafer-process
KR20040015931A chamber for manufacturing substrate of liquid crystal display device
KR20040014760A Semiconductor device fabrication apparatus having multi-hole angled gas injection system and semiconductor device fabrication method using the same
KR20040012306A valve of thin-firm deposition apparatus for atomic layer deposition
KR20040004781A Electrostatic chuck assembly
KR20040003852A Gas injection system for ALD process
KR20040003850A Controller module of apparatus for fabricating semiconductor
KR20030095801A HPD-CVD apparatus having rotation type injector and gap filling method using the same
KR20030093439A Gas heating apparatus for chemical vapor deposition process and semiconductor device fabrication method using the same
KR20030090465A Plasma etching apparatus
KR20030090463A TaN thin film forming method
KR20030090462A Method of fabricating capacitor of semiconductor device
KR20030089066A Method of fabricating Ru film for use in semiconductor devices