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ASM JAPAN KK

Overview
  • Total Patents
    140
About

ASM JAPAN KK has a total of 140 patent applications. Its first patent ever was published in 1999. It filed its patents most often in Japan and Taiwan. Its main competitors in its focus markets surface technology and coating, semiconductors and electrical machinery and energy are ASM IP HOLDING BV, ASM JAPAN and KOKUSAI ELECTRIC CORP.

Patent filings in countries

World map showing ASM JAPAN KKs patent filings in countries
# Country Total Patents
#1 Japan 132
#2 Taiwan 8

Patent filings per year

Chart showing ASM JAPAN KKs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Matsuki Nobuo 22
#2 Sato Kiyoshi 18
#3 Fukuda Hideaki 18
#4 Shimizu Akira 18
#5 Yamagishi Takayuki 17
#6 Tsuji Naoto 13
#7 Morisada Yoshinori 13
#8 Fukazawa Atsutake 11
#9 Takizawa Masahiro 10
#10 Takahashi Satoshi 10

Latest patents

Publication Filing date Title
JP2013026620A Wafer support device and method for manufacturing the same
JP2011023718A METHOD FOR FORMING STRESS-TUNED DIELECTRIC FILM HAVING Si-N BOND BY PEALD
JP2010245518A Method of depositing silicon oxide film by plasma enhanced atomic layer deposition at low temperature
JP2010272614A Semiconductor substrate processing method
JP2009176760A Method of detecting sticking of substrate
JP2008075179A Method of cleaning uv irradiation chamber
JP2008042208A Method for forming silicon carbide film containing oxygen
JP2007149954A Thin film forming method
JP2007141951A Method of forming porous film
JP2007048811A Inter-wiring layer insulating film for semiconductor device and manufacturing method thereof
JP2007005582A Substrate transfer apparatus and semiconductor substrate manufacturing apparatus mounted with the same
JP2006294868A Wafer holding apparatus
JP2006128485A Semiconductor processing apparatus
JP2006100305A Plasma processing apparatus
JP2006093342A Dc-bias voltage measurement circuit and plasma-cvd processing device containing it
JP2005310851A Thin film forming gas supply system and method therefor
JP2005236124A Shower plate and plasma treatment apparatus
JP2005209771A Apparatus and method for manufacturing thin film
JP2004228581A Insulation film on semiconductor substrate and method for forming the same
JP2005079534A Thin film forming method