INT PLASMA CORP has a total of 26 patent applications. Its first patent ever was published in 1968. It filed its patents most often in United States, Germany and United Kingdom. Its main competitors in its focus markets electrical machinery and energy, chemical engineering and machines are HOYA SCHOTT CORP, LFE CORP and ADVANCED MICRO FAB EQUIP INC.
# | Country | Total Patents | |
---|---|---|---|
#1 | United States | 10 | |
#2 | Germany | 3 | |
#3 | United Kingdom | 3 | |
#4 | Switzerland | 2 | |
#5 | France | 2 | |
#6 | Italy | 2 | |
#7 | Japan | 2 | |
#8 | Netherlands | 2 |
# | Industry | |
---|---|---|
#1 | Electrical machinery and energy | |
#2 | Chemical engineering | |
#3 | Machines | |
#4 | Semiconductors | |
#5 | Surface technology and coating | |
#6 | Audio-visual technology |
# | Name | Total Patents |
---|---|---|
#1 | Bersin Richard L | 7 |
#2 | Beaudry Harvey James | 6 |
#3 | Bersin Richard Lewis | 3 |
#4 | Reichelderfer Richard Francis | 3 |
#5 | Singleton Michael J | 2 |
#6 | Battey James Francis | 1 |
#7 | Junkin James Harold | 1 |
#8 | Richiyaado Furanshisu Riichier | 1 |
#9 | Waidtlow Robert M | 1 |
#10 | Jieemusu Efu Batsuteii | 1 |
Publication | Filing date | Title |
---|---|---|
GB1539700A | Process for etching sio2 | |
GB1544172A | Gas plasma reactor and process | |
GB1512856A | Plasma etching device and process | |
US3879597A | Plasma etching device and process | |
US3923568A | Dry plasma process for etching noble metal | |
US3648059A | Polarity control electric power supply circuit | |
US3616405A | Continuous sputtering system | |
US3569777A | Impedance matching network for plasma-generating apparatus | |
US3647676A | Method and apparatus for reacting ionized gas with a non-gaseous substance | |
US3573192A | Plasma generating apparatus | |
US3678381A | Radio frequency wattmeter | |
US3648191A | Radiofrequency generator circuits and components therefor | |
US3671195A | Method and apparatus for ashing organic substance |