OECHSNER HANS has a total of 11 patent applications. Its first patent ever was published in 1980. It filed its patents most often in United States, Australia and Denmark. Its main competitors in its focus markets electrical machinery and energy, semiconductors and chemical engineering are NEW POWER PLASMA CO LTD, ADVANCED MICRO FABRICATION EQUIPMENT CORP and ADVANCED MICRO FABRICATION EQUIPMENT INC CHINA.
# | Country | Total Patents | |
---|---|---|---|
#1 | United States | 3 | |
#2 | Australia | 2 | |
#3 | Denmark | 2 | |
#4 | WIPO (World Intellectual Property Organization) | 2 | |
#5 | EPO (European Patent Office) | 1 | |
#6 | Republic of Korea | 1 |
# | Industry | |
---|---|---|
#1 | Electrical machinery and energy | |
#2 | Semiconductors | |
#3 | Chemical engineering | |
#4 | Surface technology and coating |
# | Technology | |
---|---|---|
#1 | Electric discharge tubes | |
#2 | Plasma technique | |
#3 | Semiconductor devices | |
#4 | Coating metallic material |
# | Name | Total Patents |
---|---|---|
#1 | Oechsner Hans | 11 |
Publication | Filing date | Title |
---|---|---|
DK642988A | Procedure and device for processing solid surfaces through particle protection | |
AU1421388A | Process and device for the surface treatment of semiconductors by particle bombardment | |
AU1423888A | High-frequency ion source |