IMM INST MIKROTECH has a total of 15 patent applications. Its first patent ever was published in 1992. It filed its patents most often in EPO (European Patent Office), Germany and United States. Its main competitors in its focus markets optics, chemical engineering and measurement are GEN NANOTECHNOLOGY LLC, KLEY VICTOR B and ITOH MASAMITSU.
# | Country | Total Patents | |
---|---|---|---|
#1 | EPO (European Patent Office) | 9 | |
#2 | Germany | 5 | |
#3 | United States | 1 |
# | Industry | |
---|---|---|
#1 | Optics | |
#2 | Chemical engineering | |
#3 | Measurement | |
#4 | Machines | |
#5 | Electrical machinery and energy | |
#6 | Audio-visual technology | |
#7 | Computer technology | |
#8 | Engines, pumps and turbines |
# | Name | Total Patents |
---|---|---|
#1 | Abraham Michael Dr | 6 |
#2 | Ehrfeld Wolfgang Prof Dr | 6 |
#3 | Schmidt Martin Dr | 3 |
#4 | Abraham Michael Dipl Ing Dr | 3 |
#5 | Bauer Hans-Dieter Dr | 3 |
#6 | Lehr Heinz Dr | 2 |
#7 | Bubeck Christoph Dr | 2 |
#8 | Muellen Klaus Prof Dr | 2 |
#9 | Dietrich Thomas R Dr | 2 |
#10 | Ruf Alexander | 2 |
Publication | Filing date | Title |
---|---|---|
DE4442400A1 | Orientation and alignment sensor for space-vehicle attitude control | |
DE4314301C1 | Surface scanning sensor - has a sensor point of a photo-structurable glass | |
DE4313478C1 | Selectively variable optical data store and method for its production | |
DE4310976C1 | Vitreous carbon@ used as carrier for x=ray resist material and mask for deep lithography | |
EP0551118A1 | Method for manufacturing of non-linear micro optical elements | |
EP0551119A1 | Method for manufacturing of non-linear micro optical elements | |
DE4243860A1 | Microminiaturized electrostatic pump and process for its manufacture |