ENYA SYSTEM KK has a total of 15 patent applications. Its first patent ever was published in 1992. It filed its patents most often in Japan, Taiwan and Republic of Korea. Its main competitors in its focus markets semiconductors, machine tools and machines are TSUBAKI SEIKO KK, ALPHASEM AG and DIACON.
# | Country | Total Patents | |
---|---|---|---|
#1 | Japan | 11 | |
#2 | Taiwan | 3 | |
#3 | Republic of Korea | 1 |
# | Industry | |
---|---|---|
#1 | Semiconductors | |
#2 | Machine tools | |
#3 | Machines |
# | Technology | |
---|---|---|
#1 | Semiconductor devices | |
#2 | Unspecified technologies | |
#3 | Tools for connecting or disengaging |
# | Name | Total Patents |
---|---|---|
#1 | Kaku Yokou | 4 |
#2 | Doi Kimio | 3 |
#3 | Hamano Makoto | 3 |
#4 | Shiono Masahito | 2 |
#5 | Terasawa Yukihiko | 2 |
#6 | Takeda Fumihiro | 1 |
#7 | Teramoto Takashi | 1 |
#8 | Yokosuka Noriyoshi | 1 |
#9 | Hashizume Michihiro | 1 |
#10 | Suzuki Narikazu | 1 |
Publication | Filing date | Title |
---|---|---|
JP2001077079A | Etching treatment and device | |
JP2000332153A | Method for cleaning solder bump forming surface of wafer-level csp | |
JP2000232089A | Method and device for etching one-side surface of wafer | |
JP2000138193A | Method of preventing adhesion of deposit on mount plate | |
JP2000127034A | Wafer sticking method to mount plate and its device | |
JP2000005982A | Method for forming reference plane of sliced wafer | |
JPH11354493A | Method and apparatus for etching notch of wafer | |
JPH11254316A | Wafer mounting device | |
JPH11195630A | Chuck for brush scrubber | |
JPH11168079A | Brush scriber | |
JPH11111824A | Wafer take-off device |