EMD CORP has a total of 73 patent applications. It decreased the IP activity by 100.0%. Its first patent ever was published in 2005. It filed its patents most often in Republic of Korea, Taiwan and WIPO (World Intellectual Property Organization). Its main competitors in its focus markets electrical machinery and energy, surface technology and coating and chemical engineering are HOFFMAN DANIEL J, JEHARA and APPLIED PROCESS TECHNOLOGIES I.
# | Country | Total Patents | |
---|---|---|---|
#1 | Republic of Korea | 15 | |
#2 | Taiwan | 14 | |
#3 | WIPO (World Intellectual Property Organization) | 14 | |
#4 | China | 13 | |
#5 | EPO (European Patent Office) | 11 | |
#6 | United States | 6 |
# | Industry | |
---|---|---|
#1 | Electrical machinery and energy | |
#2 | Surface technology and coating | |
#3 | Chemical engineering | |
#4 | Semiconductors | |
#5 | Materials and metallurgy |
# | Technology | |
---|---|---|
#1 | Electric discharge tubes | |
#2 | Coating metallic material | |
#3 | Plasma technique | |
#4 | Semiconductor devices | |
#5 | Treatment of glass |
# | Name | Total Patents |
---|---|---|
#1 | Ebe Akinori | 67 |
#2 | Setsuhara Yuichi | 47 |
#3 | Watanabe Masanori | 15 |
#4 | Nishimura Eiichi | 5 |
#5 | Ino Eiji | 4 |
#6 | Ashida Hajime | 4 |
#7 | Ishihara Shinichiro | 4 |
#8 | Ando Yasunori | 4 |
#9 | Akinori Ebe | 4 |
#10 | Watanabe Akira | 4 |
Publication | Filing date | Title |
---|---|---|
EP3813092A1 | Plasma source | |
US2019333735A1 | Plasma source and plasma processing apparatus | |
WO2012033191A1 | Plasma processing apparatus | |
TW201311060A | An antenna for a plasma processing apparatus, and a plasma processing apparatus using the same | |
KR20140060295A | Antenna for plasma processing apparatus, and plasma processing apparatus using antenna | |
KR20180027635A | Sputtering thin film forming apparatus | |
TW201309824A | Sputtering film forming device | |
EP2546385A1 | Sputtering device | |
TW201212728A | Plasma processing device | |
KR20130056901A | Plasma processing apparatus | |
CN102144044A | Thin film-forming sputtering device | |
KR20110016450A | Plasma generating apparatus and plasma processing apparatus | |
KR20100134629A | High frequency antenna unit and plasma processing apparatus |