EMD KK has a total of 11 patent applications. Its first patent ever was published in 2007. It filed its patents most often in Japan. Its main competitors in its focus markets electrical machinery and energy, chemical engineering and surface technology and coating are APPLIED PROCESS TECHNOLOGIES I, EMD CORP and IPLAS INNOVATIVE PLASMA SYSTEM.
# | Country | Total Patents | |
---|---|---|---|
#1 | Japan | 11 |
# | Technology | |
---|---|---|
#1 | Electric discharge tubes | |
#2 | Plasma technique | |
#3 | Coating metallic material | |
#4 | Treatment of glass |
# | Name | Total Patents |
---|---|---|
#1 | Ebe Akinori | 11 |
#2 | Setsuhara Yuichi | 8 |
#3 | Nishikawa Masazumi | 2 |
#4 | Watanabe Masanori | 1 |
#5 | Ishihara Shinichiro | 1 |
#6 | Nishimura Eiichi | 1 |
#7 | Maeda Naoki | 1 |
#8 | Ino Eiji | 1 |
#9 | Ashida Hajime | 1 |
#10 | Watanabe Akira | 1 |
Publication | Filing date | Title |
---|---|---|
JP2015183242A | Manufacturing method of thin film | |
JP2015183241A | Manufacturing method of thin film | |
JP2011071123A | Plasma processing device | |
JP2011179061A | Sputtering thin film deposition system | |
JP2011181292A | Antenna for plasma treatment device, and plasma treatment device using the same | |
JP2010225296A | Inductively coupled antenna unit and plasma processing device | |
JP2010212105A | Plasma processing device | |
JP2010212104A | Plasma processing device | |
JP2009123906A | Plasma treatment equipment | |
JP2009123513A | Plasma processing device |