VLSI TECHNOLOGY RES ASS has a total of 73 patent applications. Its first patent ever was published in 1977. It filed its patents most often in United States, Germany and EPO (European Patent Office). Its main competitors in its focus markets semiconductors, machines and optics are ELECTRON VISION CORP, SEMICONDUCTOR RES FOUND and ACER SEMICONDUCTOR MANUFACTURI.
# | Country | Total Patents | |
---|---|---|---|
#1 | United States | 50 | |
#2 | Germany | 12 | |
#3 | EPO (European Patent Office) | 7 | |
#4 | United Kingdom | 3 | |
#5 | France | 1 |
# | Industry | |
---|---|---|
#1 | Semiconductors | |
#2 | Machines | |
#3 | Optics | |
#4 | Electrical machinery and energy | |
#5 | Measurement | |
#6 | Surface technology and coating |
# | Name | Total Patents |
---|---|---|
#1 | Mizukami Koichiro | 6 |
#2 | Matsushita Yoshiaki | 6 |
#3 | Migitaka Masatoshi | 6 |
#4 | Shinozaki Satoshi | 5 |
#5 | Kishino Seigo | 5 |
#6 | Shibata Hiroshi | 5 |
#7 | Shinada Kazuyoshi | 4 |
#8 | Wada Hirotsugu | 4 |
#9 | Shinozaki Toshiaki | 4 |
#10 | Iwamatsu Seiichi | 4 |
Publication | Filing date | Title |
---|---|---|
EP0037040A2 | Method of manufacturing a semiconductor device | |
EP0029986A2 | Method of manufacturing a semiconductor device with a Schottky junction | |
US4371423A | Method of manufacturing semiconductor device utilizing a lift-off technique | |
US4317200A | Method and device for testing a sequential circuit divided into a plurality of partitions | |
US4348804A | Method of fabricating an integrated circuit device utilizing electron beam irradiation and selective oxidation | |
US4218291A | Process for forming metal and metal silicide films | |
US4218621A | Electron beam exposure apparatus | |
US4232439A | Masking technique usable in manufacturing semiconductor devices |