MI2 FACTORY GMBH has a total of 22 patent applications. It decreased the IP activity by 100.0%. Its first patent ever was published in 2016. It filed its patents most often in Germany, WIPO (World Intellectual Property Organization) and United States. Its main competitors in its focus markets electrical machinery and energy, semiconductors and surface technology and coating are HIMORI SHINJI, AXCELIS TECH INC and KOSHIISHI AKIRA.
# | Country | Total Patents | |
---|---|---|---|
#1 | Germany | 10 | |
#2 | WIPO (World Intellectual Property Organization) | 4 | |
#3 | United States | 3 | |
#4 | China | 2 | |
#5 | EPO (European Patent Office) | 2 | |
#6 | Japan | 1 |
# | Industry | |
---|---|---|
#1 | Electrical machinery and energy | |
#2 | Semiconductors | |
#3 | Surface technology and coating | |
#4 | Engines, pumps and turbines |
# | Technology | |
---|---|---|
#1 | Electric discharge tubes | |
#2 | Semiconductor devices | |
#3 | Coating metallic material | |
#4 | X-ray microscopes |
# | Name | Total Patents |
---|---|---|
#1 | Csato Constantin | 21 |
#2 | Krippendorf Florian | 21 |
#3 | Constantin Csato | 1 |
#4 | Florian Krippendorf | 1 |
Publication | Filing date | Title |
---|---|---|
DE102019120623A1 | Energy filters for use in implanting ions into a substrate | |
DE102019112985A1 | Process for the manufacture of semiconductor components | |
DE102019112773A1 | Apparatus and method for implanting particles in a substrate | |
DE102016122791B3 | Ion implantation system, filter chamber and implantation method using an energy filter element | |
DE102016015820B3 | implanter | |
DE102016106119A1 | Energy filter element for ion implantation systems for use in the production of wafers | |
DE102016015821B3 | Method for ion implantation | |
DE102016015819B3 | Method for ion implantation | |
DE102016015822B3 | Method for ion implantation | |
DE102016015823B3 | Method for ion implantation |