| # | Country | Total Patents | |
|---|---|---|---|
| #1 | Japan | 7 | |
| #2 | Republic of Korea | 5 | |
| #3 | Taiwan | 2 | |
| #4 | United States | 2 |
| # | Industry | |
|---|---|---|
| #1 | Electrical machinery and energy | |
| #2 | Semiconductors | |
| #3 | Machines | |
| #4 | Measurement | |
| #5 | Surface technology and coating | |
| #6 | Chemical engineering |
| # | Technology | |
|---|---|---|
| #1 | Electric discharge tubes | |
| #2 | Semiconductor devices | |
| #3 | Unspecified technologies | |
| #4 | Measuring electric variables | |
| #5 | Plasma technique | |
| #6 | Coating metallic material |
| # | Name | Total Patents |
|---|---|---|
| #1 | Hama Kiichi | 7 |
| #2 | Koshimizu Chishio | 4 |
| #3 | Ishihara Hiroyuki | 3 |
| #4 | Kitamura Akinori | 2 |
| #5 | Saeku Satakesi | 1 |
| #6 | Toda Akihito | 1 |
| #7 | Shimizu Masafumi | 1 |
| #8 | Oshima Kouichi | 1 |
| #9 | Nozawa Akira | 1 |
| #10 | Tozawa Shigeki | 1 |
| Publication | Filing date | Title |
|---|---|---|
| JP2001127046A | Plasma treatment system | |
| JP2000200771A | Plasma processing method | |
| JP2000200772A | Plasma processing method | |
| JPH11251303A | Plasma treating equipment | |
| US6149760A | Plasma processing apparatus | |
| JP2000036490A | Plasma processor and method therefor | |
| JPH11126699A | Plasma treating device | |
| JPH11111697A | Plasma processor |