| # | Country | Total Patents | |
|---|---|---|---|
| #1 | United States | 13 |
| # | Industry | |
|---|---|---|
| #1 | Electrical machinery and energy | |
| #2 | Semiconductors | |
| #3 | Surface technology and coating | |
| #4 | Chemical engineering | |
| #5 | Machines |
| # | Technology | |
|---|---|---|
| #1 | Electric discharge tubes | |
| #2 | Semiconductor devices | |
| #3 | Coating metallic material | |
| #4 | Plasma technique | |
| #5 | Unspecified technologies |
| # | Name | Total Patents |
|---|---|---|
| #1 | Koshiishi Akira | 13 |
| #2 | Kobayashi Noriyuki | 5 |
| #3 | Sugimoto Masaru | 5 |
| #4 | Yamazawa Yohei | 4 |
| #5 | Iwata Manabu | 4 |
| #6 | Ohtani Ryuji | 4 |
| #7 | Matsumoto Naoki | 4 |
| #8 | Kibi Kazuo | 4 |
| #9 | Yano Daisuke | 4 |
| #10 | Saito Masashi | 4 |
| Publication | Filing date | Title |
|---|---|---|
| US2013157469A1 | Semiconductor processing system with source for decoupled ion and radical control | |
| US2008073032A1 | Stage for plasma processing apparatus, and plasma processing apparatus | |
| US2008038162A1 | Table for use in plasma processing system and plasma processing system |