CAULDRON LP has a total of 74 patent applications. Its first patent ever was published in 1989. It filed its patents most often in Canada, United States and Australia. Its main competitors in its focus markets semiconductors, chemical engineering and optics are BEIJING U PRECISIUM TECH CO LTD, Shanghai micro electronics equipment co ltd and LASA IND INC.
# | Country | Total Patents | |
---|---|---|---|
#1 | Canada | 7 | |
#2 | United States | 6 | |
#3 | Australia | 5 | |
#4 | Brazil | 5 | |
#5 | Czechia | 5 | |
#6 | EPO (European Patent Office) | 5 | |
#7 | Latvia | 5 | |
#8 | Norway | 5 | |
#9 | WIPO (World Intellectual Property Organization) | 5 | |
#10 | Republic of Korea | 4 | |
#11 | China | 3 | |
#12 | Finland | 3 | |
#13 | Hungary | 3 | |
#14 | Mexico | 3 | |
#15 | Singapore | 3 | |
#16 | Hong Kong | 2 | |
#17 | Taiwan | 2 | |
#18 | Japan | 1 | |
#19 | Malaysia | 1 | |
#20 | Russian Federation | 1 |
# | Industry | |
---|---|---|
#1 | Semiconductors | |
#2 | Chemical engineering | |
#3 | Optics | |
#4 | Machine tools | |
#5 | Machines |
# | Name | Total Patents |
---|---|---|
#1 | Engelsberg Audrey C | 68 |
#2 | Johnson Andrew W | 22 |
#3 | Parker William P | 22 |
#4 | Dehais Joseph A | 18 |
#5 | Fitzpatrick Donna R | 7 |
#6 | Bethell Donna F | 5 |
#7 | Engelsberg A C | 2 |
#8 | Fitzpatrick D R | 1 |
#9 | Parker William | 1 |
#10 | Parker W P | 1 |
Publication | Filing date | Title |
---|---|---|
US6048588A | Method for enhancing chemisorption of material | |
CA2259910A1 | Removal of material by radiation applied at an oblique angle | |
US5800625A | Removal of material by radiation applied at an oblique angle | |
TW284907B | Removal of material by polarized irradiation and back side application for radiation | |
US5821175A | Removal of surface contaminants by irradiation using various methods to achieve desired inert gas flow over treated surface | |
US5643472A | Selective removal of material by irradiation | |
US5531857A | Removal of surface contaminants by irradiation from a high energy source | |
SG125494G | Removal of surface contaminants by irradiation from a high-energy source | |
AU6629794A | Removal of surface contaminants by irradiation | |
RU94042468A | Device for cleaning substrate surface from unwanted impurities | |
KR0157608B1 | Removal of surface contaminants by irradiation from a high energy source |