HAWRYLUK ANDREW M has a total of 11 patent applications. Its first patent ever was published in 1989. It filed its patents most often in United States. Its main competitors in its focus markets semiconductors, optics and machine tools are V TECH CO LTD, RNR LAB INC and IM JAMES S.
# | Country | Total Patents | |
---|---|---|---|
#1 | United States | 11 |
# | Industry | |
---|---|---|
#1 | Semiconductors | |
#2 | Optics | |
#3 | Machine tools | |
#4 | Electrical machinery and energy | |
#5 | Measurement | |
#6 | Micro-structure and nano-technology |
# | Name | Total Patents |
---|---|---|
#1 | Hawryluk Andrew M | 11 |
#2 | Grek Boris | 2 |
#3 | Markle David A | 2 |
#4 | Fuchs Detlef | 1 |
#5 | True Emily | 1 |
#6 | Ranjan Manish | 1 |
#7 | Seppala Lynn G | 1 |
#8 | Flack Warren | 1 |
#9 | Flack Warren W | 1 |
#10 | Hsieh Robert L | 1 |
Publication | Filing date | Title |
---|---|---|
US2014176923A1 | Wynn-dyson imaging system with reduced thermal distortion | |
US2014141538A1 | Methods of characterizing semiconductor light-emitting devices based on product wafer characteristics | |
US2013267096A1 | Systems for and methods of laser-enhanced plasma processing of semiconductor materials | |
US2012153323A1 | Photolithographic LED fabrication using phase-shift mask | |
US2011038704A1 | Sub-field enhanced global alignment | |
US2009114630A1 | Minimization of surface reflectivity variations | |
US5003567A | Soft x-ray reduction camera for submicron lithography |