Large-area static state focusing and leveling apparatus and method for photoetching machine Including a light source, a lightening mirror group, a projection slit, a projection mirror group, a detection mirror group, and detector
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Device and method for correcting focal length and leveling based on pre-scanning track preferably applicable to light etching machine to measure the height and inclination of a silicon wafer
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Multi-channel alignment system based on spectrum processing, alignment signal processing method and photo etching equipment sequentially including an illumination unit, a multi-channel detecting and combining unit, at least one first detector, and a signal processing and controlling unit along the light beam transmission direction
