BALSEANU MIHAELA has a total of 12 patent applications. Its first patent ever was published in 2006. It filed its patents most often in United States. Its main competitors in its focus markets semiconductors, surface technology and coating and micro-structure and nano-technology are FOCUS LIGHTINGS TECH INC, XIANGNENG HUALEI OPTOELECTRONIC CO LTD and JIANGXI ZHAOCHI SEMICONDUCTOR CO LTD.
# | Country | Total Patents | |
---|---|---|---|
#1 | United States | 12 |
# | Industry | |
---|---|---|
#1 | Semiconductors | |
#2 | Surface technology and coating | |
#3 | Micro-structure and nano-technology | |
#4 | Audio-visual technology | |
#5 | Machines |
# | Technology | |
---|---|---|
#1 | Semiconductor devices | |
#2 | Coating metallic material | |
#3 | Nanostructure applications | |
#4 | Casings and printed circuits | |
#5 | Unspecified technologies |
# | Name | Total Patents |
---|---|---|
#1 | Balseanu Mihaela | 12 |
#2 | Xia Li-Qun | 12 |
#3 | Witty Derek R | 7 |
#4 | Roflox Isabelita | 5 |
#5 | Shek Mei-Yee | 5 |
#6 | M Saad Hichem | 4 |
#7 | Zubkov Vladimir | 4 |
#8 | Haigh Jr Thomas J | 3 |
#9 | Grill Alfred | 3 |
#10 | Cohen Stephan A | 3 |
Publication | Filing date | Title |
---|---|---|
US2013333923A1 | MODULATED COMPOSITIONAL AND STRESS CONTROLLED MULTILAYER ULTRATHIN CONFORMAL SiNx DIELECTRICS USED IN NANO DEVICE FABRICATION | |
US2013189841A1 | Engineering dielectric films for cmp stop | |
US2012248617A1 | Multilayered low k cap with conformal gap fill and UV stable compressive stress properties | |
US2010098884A1 | Boron film interface engineering | |
US2009263972A1 | Boron nitride and boron-nitride derived materials deposition method | |
US2010096687A1 | Method of forming a non-volatile memory having a silicon nitride charge trap layer | |
US2008020591A1 | Method to increase silicon nitride tensile stress using nitrogen plasma in-situ treatment and ex-situ UV cure | |
US2006269693A1 | Method to increase tensile stress of silicon nitride films using a post PECVD deposition UV cure |