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AZ ELECTRONIC MATERIALS USA

Overview
  • Total Patents
    570
  • GoodIP Patent Rank
    217,506
About

AZ ELECTRONIC MATERIALS USA has a total of 570 patent applications. Its first patent ever was published in 1996. It filed its patents most often in EPO (European Patent Office), China and WIPO (World Intellectual Property Organization). Its main competitors in its focus markets optics, macromolecular chemistry and polymers and machines are CLARIANT JAPAN KK, TOKYO OHKA KOGYO CO LTD and AZ ELECTRONIC MAT IP JAPAN KK.

Patent filings per year

Chart showing AZ ELECTRONIC MATERIALS USAs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Dammel Ralph R 115
#2 Padmanaban Munirathna 74
#3 Rahman M Dalil 74
#4 Neisser Mark O 72
#5 Wu Hengpeng 63
#6 Abdallah David J 53
#7 Abdallah David 51
#8 Neisser Mark 47
#9 Oberlander Joseph E 46
#10 Zhang Ruzhi 45

Latest patents

Publication Filing date Title
CN103907057A Nanocomposite negative photosensitive composition and use thereof
CN103907058A Nanocomposite positive photosensitive composition and use thereof
CN103797066A Compositions of neutral layer for directed self-assembling block copolymers and processes thereof
CN103597043A Bottom antireflective coating compositions and processes thereof
SG192626A1 Antireflective coating composition and process thereof
TW201219969A Underlayer developable coating compositions and processes thereof
TW201224666A Edge bead remover for coatings
TW201026798A Coating compositions
CN102576193A Positive-working photoimageable bottom antireflective coating
TW201029963A A photosensitive composition
WO2009133456A1 Spin-on graded k silicon antireflective coating
CN101981509A A process for shrinking dimensions between photoresist pattern comprising a pattern hardening step
EP2326991A1 A hardmask process for forming a reverse tone image
EP2274650A1 A photoresist image-forming process using double patterning
WO2009090474A1 A process for imaging a photoresist coated over an antireflective coating
TW200916957A Thick film resists
KR20100047287A Underlayer coating composition based on a crosslinkable polymer
WO2009019574A1 Photoresist composition for deep uv and process thereof
TW200910013A Antireflective coating composition
US2009317739A1 Composition for coating over a photoresist pattern