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TOKYO OHKA KOGYO CO LTD

Overview
  • Total Patents
    8,825
  • GoodIP Patent Rank
    684
  • Filing trend
    ⇩ 13.0%
About

TOKYO OHKA KOGYO CO LTD has a total of 8,825 patent applications. It decreased the IP activity by 13.0%. Its first patent ever was published in 1971. It filed its patents most often in Japan, Taiwan and Republic of Korea. Its main competitors in its focus markets optics, semiconductors and macromolecular chemistry and polymers are BAE YOUNG CHEOL, CLARIANT JAPAN KK and SAMYANGEMS CO LTD.

Patent filings per year

Chart showing TOKYO OHKA KOGYO CO LTDs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Nakayama Toshimasa 395
#2 Shiota Dai 356
#3 Utsumi Yoshiyuki 354
#4 Hada Hideo 320
#5 Iwai Takeshi 303
#6 Noda Kunihiro 302
#7 Wakiya Kazumasa 291
#8 Chisaka Hiroki 256
#9 Inao Yoshihiro 255
#10 Misumi Koichi 251

Latest patents

Publication Filing date Title
WO2021070764A1 Negative-working photosensitive resin composition, photosensitive resist film, pattern formation method, cured film, cured film production method, and rolled body
US2021104411A1 Etching solution, and method of producing semiconductor device
WO2021065766A1 Method for screening secretion-producing cells and kit for screening secretion-producing cells
WO2021065796A1 Curable composition, cured material, and method for forming cured material
WO2021065765A1 Cell screening device and cell screening kit
WO2021065771A1 Cell screening device and cell screening kit
WO2021044985A1 Metal oxide particle dispersion composition and dispersion method for metal oxide particles
WO2021039783A1 Curable ink composition, cured material and nanocomposite
KR20210024973A Resist composition and method of forming resist pattern
KR20210027105A Resist composition and method of forming resist pattern
US2021055656A1 Resist composition, method of forming resist pattern, polymeric compound, and compound
KR20210021924A Photosensitive resin composition, manufacturing method for patterned cured film, and patterned cured film
WO2021049251A1 Information processing system, information processing device, learning device, information processing method, learning method, and program
KR20210018118A Positive-type photosensitive resin composition, method of manufacturing patterned resist film, and patterned resist film
US2021055457A1 Color filter manufacturing method, color filter, and resin composition
WO2021024925A1 Chemically amplified positive photosensitive resin composition, photosensitive dry film, production method for photosensitive dry film, production method for patterned resist film, and production method for compound, photo-acid generator, and n–organosulfonyloxy compound
JP2020197718A Chemical amplification type positive photosensitive resin composition
US2021017204A1 Surface treatment agent, surface treatment method, and area selective deposition method
KR20210014573A Protective film forming agent and method for producing semiconductor chip
WO2021015005A1 Wavelength conversion film, wavelength conversion film forming composition, and cluster-containing quantum dot production method