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US5362607A
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Method for making a patterned resist substrate composite
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US5310619A
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Resist compositions comprising a phenolic resin, an acid forming onium salt and a tert-butyl ester or tert-butyl carbonate which is acid-cleavable
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Spin castable mixtures useful for making deep-UV contrast enhancement layers
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US5106723A
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Contrast enhancement layer compositions, alkylnitrones, and use
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SG72390G
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Photobleachable compositions
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US5002993A
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Contrast enhancement layer compositions, alkylnitrones, and use
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US5108874A
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Composite useful in photolithography
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US4990665A
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Diarylnitrones
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US4931380A
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Pre-exposure method for increased sensitivity in high contrast resist development of positive working diazo ketone photoresist
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EP0301559A2
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Spin castable mixtures useful for making deep-UV contrast enhancement layers
|
|
EP0249139A2
|
|
Resist compositions and use
|
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IE871053L
|
|
Resist compositions and use
|
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IE870965L
|
|
Contrast enhancement layer compositions, alkylnitrones, and use
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|
US4968757A
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Soluble silicone-imide copolymers
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IE883057L
|
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Aryl nitrones
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