| # | Country | Total Patents | |
|---|---|---|---|
| #1 | United States | 7 | |
| #2 | WIPO (World Intellectual Property Organization) | 6 | |
| #3 | Germany | 2 | |
| #4 | Republic of Korea | 2 | |
| #5 | Taiwan | 2 | |
| #6 | China | 1 | |
| #7 | EPO (European Patent Office) | 1 | |
| #8 | Japan | 1 |
| # | Industry | |
|---|---|---|
| #1 | Surface technology and coating | |
| #2 | Semiconductors | |
| #3 | Machines | |
| #4 | Measurement |
| # | Technology | |
|---|---|---|
| #1 | Coating metallic material | |
| #2 | Semiconductor devices | |
| #3 | Unspecified technologies | |
| #4 | Special measuring |
| # | Name | Total Patents |
|---|---|---|
| #1 | Mukherjee Niloy | 15 |
| #2 | Rathi Somilkumar J | 10 |
| #3 | Okuyama Yoshikazu | 6 |
| #4 | Jung Sung-Hoon | 6 |
| #5 | Naghibolashrafi Nariman | 6 |
| #6 | Karim M Ziaul | 6 |
| #7 | Choi Bo Seon | 5 |
| #8 | Rathi Somilkumar | 5 |
| #9 | Mack Jerry | 4 |
| #10 | Vats Vinayek Veer | 4 |
| Publication | Filing date | Title |
|---|---|---|
| US2021125849A1 | Systems and methods of placing substrates in semiconductor manufacturing equipment | |
| US2021104397A1 | Smooth titanium nitride layers and methods of forming the same | |
| US2021104396A1 | Conformal and smooth titanium nitride layers and methods of forming the same | |
| US2021104433A1 | Conformal titanium nitride-based thin films and methods of forming same | |
| US2021104665A1 | Titanium silicon nitride barrier layer | |
| US2018350657A1 | Multi-region diffusion barrier containing titanium, silicon and nitrogen | |
| US2018347040A1 | TiSiN Coating Method |