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XTREME TECH GMBH

Overview
  • Total Patents
    175
About

XTREME TECH GMBH has a total of 175 patent applications. Its first patent ever was published in 2001. It filed its patents most often in Germany, United States and Japan. Its main competitors in its focus markets medical technology, optics and micro-structure and nano-technology are ADVANCED ENERGY SYST, PLEX LLC and KOMORI HIROSHI.

Patent filings per year

Chart showing XTREME TECH GMBHs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Kleinschmidt Juergen 71
#2 Hergenhan Guido 55
#3 Ziener Christian 47
#4 Gaebel Kai 40
#5 Schriever Guido 22
#6 Flohrer Frank 15
#7 Brudermann Jesko 14
#8 Kloepfel Diethard 13
#9 Korobochko Vladimir 12
#10 Ahmad Imtiaz 11

Latest patents

Publication Filing date Title
DE102012109809B3 Device for producing extreme UV radiation based on gas discharge plasma, has stripper including blowing elements i.e. grooves, and boundary at legs so that stripper is axially adjustable, where grooves are formed in rotation direction
DE102011016058A1 Method and device for adjusting properties of a beam of high-energy radiation emitted from a plasma
DE102010053323B3 Method for the spatially resolved measurement of parameters in a cross section of a beam of high-energy, high-intensity radiation
DE102010047419A1 Method and apparatus for generating EUV radiation from a gas discharge plasma
KR20120100922A Foil trap device with improved heat resistance
DE102009020776A1 Arrangement for the continuous production of liquid tin as emitter material in EUV radiation sources
DE102008049494A1 Method and arrangement for operating plasma-based short-wave radiation sources
DE102008031650A1 Arrangement for debris suppression in a plasma-based radiation source for generating short-wave radiation
DE102007051295A1 Arrangement for generating EUV radiation
DE102007033701A1 Method and arrangement for cleaning optical surfaces in plasma-based radiation sources
DE102007023444A1 Device for generating a gas curtain for plasma-based EUV radiation sources
DE102007020742B3 Arrangement for switching large electrical currents via a gas discharge
DE102007004440A1 Apparatus and method for generating extreme ultraviolet radiation by means of an electrically operated gas discharge
US2007170367A1 Narrow-band transmission filter for EUV radiation
DE102006060368B3 Method and arrangement for stabilizing the mean emitted radiation power of a pulsed operated radiation source
DE102006036173A1 Method for pulse energy regulation of gas discharge radiation sources
DE102006027856B3 Extreme ultraviolet radiation generating arrangement for semiconductor lithography, has electrodes immersed into containers, directed into vacuum chamber and re-guided into containers after electrical discharge between electrodes
DE102006022823A1 Arrangement for generating EUV radiation based on a gas discharge plasma
DE102006017904A1 Arrangement for generating extreme ultraviolet radiation from an energy beam generated plasma with high conversion efficiency and minimal contamination
DE102006015640B3 Extreme ultraviolet radiation generating device for use in extreme ultraviolet lithography, has high voltage supply unit comprising capacitor battery, which consists of capacitor units that are arranged along round rings