| # | Country | Total Patents | |
|---|---|---|---|
| #1 | EPO (European Patent Office) | 6 | |
| #2 | United States | 4 | |
| #3 | WIPO (World Intellectual Property Organization) | 2 | |
| #4 | China | 1 | |
| #5 | Japan | 1 | |
| #6 | Taiwan | 1 |
| # | Industry | |
|---|---|---|
| #1 | Machine tools | |
| #2 | Semiconductors | |
| #3 | Chemical engineering |
| # | Technology | |
|---|---|---|
| #1 | Grinding or polishing devices | |
| #2 | Semiconductor devices | |
| #3 | Cleaning | |
| #4 | Drying solid materials by removing liquid |
| # | Name | Total Patents |
|---|---|---|
| #1 | Hyde Thomas C | 8 |
| #2 | Gill Gerald L Jr | 6 |
| #3 | Gill Jr Gerald L | 3 |
| #4 | Jackson Paul D | 1 |
| #5 | Sanford James E | 1 |
| #6 | Ong Glen | 1 |
| #7 | Roberts John V H | 1 |
| #8 | Schultz Stephen C | 1 |
| #9 | Rice Richard B | 1 |
| #10 | Baca John G | 1 |
| Publication | Filing date | Title |
|---|---|---|
| US5456627A | Conditioner for a polishing pad and method therefor | |
| US5144711A | Cleaning brush for semiconductor wafer | |
| WO9114538A1 | Apparatus for interlayer planarization of semiconductor material | |
| EP0434307A2 | Centrifugal spin dryer for semiconductor wafer | |
| US5095661A | Apparatus for transporting wafer to and from polishing head | |
| US4944119A | Apparatus for transporting wafer to and from polishing head | |
| EP0284343A2 | Polishing apparatus |