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VISTEC SEMICONDUCTOR SYSTEMS J

Overview
  • Total Patents
    24
About

VISTEC SEMICONDUCTOR SYSTEMS J has a total of 24 patent applications. Its first patent ever was published in 2000. It filed its patents most often in Germany, United States and Japan. Its main competitors in its focus markets measurement, semiconductors and computer technology are RUDOLPH TECH INC, HYPERNEX INC and INTEKPLUS CO LTD.

Patent filings in countries

World map showing VISTEC SEMICONDUCTOR SYSTEMS Js patent filings in countries
# Country Total Patents
#1 Germany 12
#2 United States 9
#3 Japan 2
#4 EPO (European Patent Office) 1

Patent filings per year

Chart showing VISTEC SEMICONDUCTOR SYSTEMS Js patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Wolter Detlef 8
#2 Iffland Thomas 8
#3 Schenck Rene 7
#4 Wienecke Joachim 6
#5 Deutscher Winfried 5
#6 Halm Christian 4
#7 Slodowski Matthias 3
#8 Backhaus Kuno 2
#9 Rennicke Frank 1
#10 Pohlmann Ulrich 1

Latest patents

Publication Filing date Title
DE102008037419A1 Device and method for determining the position of a disc-shaped object
DE102008044508A1 Measuring system has supply station and inspection station for examining article, particularly wafer, where supply station and inspection station are separated from each other
DE102008027861A1 Device for holding disc-shaped objects
DE102007037705A1 Holding device for use in coordinates-measuring device, has supporting points for two-dimensional substrate such that supporting points carry two-dimensional substrate, where substrate is force-freely held with objects
DE102007010224A1 Device for holding disk-shaped objects
DE102007009255A1 Device for scanning surface of semiconductor, comprises scanning device for scanning surface, which has lighting device that withdraws light rays and glass fiber element
DE102006003472A1 Method for adapting a model spectrum to a measurement spectrum
DE102006003473A1 Method of calculating a model spectrum
DE102005017642A1 Method for inspecting a wafer
DE102004058128A1 System for inspection of a disc-shaped object
DE102004020849A1 Optical measuring arrangement, in particular for measuring layer thicknesses
DE10102542A1 Arrangement for the visual inspection of substrates