VISTEC LITHOGRAPHY LTD

Overview

Total Patents

11

About

VISTEC LITHOGRAPHY LTD has a total of 11 patent applications. Its first patent ever was published in 2005. It filed its patents most often in United Kingdom, EPO (European Patent Office) and United States. Its main competitors in its focus markets electrical machinery and energy, micro-structure and nano-technology and mechanical elements are VISTEC LITHOGRAPHY INC, YASHIMA JUN and AET JAPAN KK.

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Patent filings in countries

World map showing VISTEC LITHOGRAPHY LTDs patent filings in countries

#	Country	Total Patents
#1	United Kingdom	9
#2	EPO (European Patent Office)	1
#3	United States	1

Patent filings per year

Chart showing VISTEC LITHOGRAPHY LTDs patent filings per year from 1900 to 2020

Similar Companies

VISTEC LITHOGRAPHY INC 98% similarity

YASHIMA JUN 98% similarity

AET JAPAN KK 97% similarity

JUPITER TOY CO 97% similarity

RIIPURU KK 96% similarity

LEEPL CORP 96% similarity

LEICA MICROSYS LITHOGRAPHY LTD 95% similarity

NFAB LTD 94% similarity

WIELAND MARCO JAN-JACO 93% similarity

VISCOR PETR 93% similarity

Focus industries

#	Industry
#1	Electrical machinery and energy
#2	Micro-structure and nano-technology
#3	Mechanical elements
#4	Optics
#5	Audio-visual technology
#6	Semiconductors
#7	Measurement
#8	Engines, pumps and turbines

Focus technologies

#	Technology
#1	Electric discharge tubes
#2	Nanostructure applications
#3	Springs
#4	Photomechanical semiconductor production
#5	Measuring length, angles and areas
#6	Frames
#7	X-ray microscopes
#8	Special information storage
#9	Semiconductor devices

Top inventors

#	Name	Total Patents
#1	Harris Paul George	6
#2	Tingay John Melbourne	3
#3	Laidler Ian	2
#4	Rafferty Brian	2
#5	Hoyle Philip Clifford	2
#6	King David Martin Platton	1
#7	Mcclelland Andrew William	1
#8	Williams Jason Geraint Seaborne	1
#9	Crosland Nigel Charles Edward	1

Latest patents

Publication	Filing date	Title
GB0714913D0	2007-07-31	Pattern writing on a rotaing substrate
GB0700464D0	2007-01-10	Apparatus support structure
GB0700467D0	2007-01-10	Apparatus support
GB0623875D0	2006-11-29	Error source identification in dot arrays
GB0622362D0	2006-11-09	Component mounting in movement sensitive equipment
GB0620527D0	2006-10-16	Electron beam influencing in an electron beam lithography machine
GB0620288D0	2006-10-12	Electron beam influencing in an electron beam lithography machine
GB0620286D0	2006-10-12	Reduction in stage movement reaction force in an electron beam lithography machine
GB0620287D0	2006-10-12	Workpiece height adjustment in an eletron beam lithography machine