TW202018118A
|
|
Composition for high temperature atomic layer deposition of high quality silicon oxide thin films
|
SG11202011887XA
|
|
Siloxane compositions and methods for using the compositions to deposit silicon containing films
|
SG10201903201XA
|
|
Organoamino-functionalized cyclic oligosiloxanes for deposition of silicon-containing films
|
TW201928536A
|
|
Photoresist stripper
|
TW201903207A
|
|
Etching solution for selectively removing silicon nitride during manufacture of a semiconductor device
|
TW201928099A
|
|
Disubstituted alkyne dicobalt hexacarbonyl compounds, method of making and method of use thereof
|
SG11201807211XA
|
|
Compositions and methods using same for deposition of silicon-containing film
|
SG11201805289WA
|
|
Compositions and methods using same for deposition of silicon-containing film
|
TW201819668A
|
|
Preparation and composition of halidosilane compounds, and container containing same
|
TW201634756A
|
|
Cleaning formula
|
TW201817835A
|
|
Composite abrasive particles for chemical mechanical planarization composition and method of use thereof
|
TW201621281A
|
|
Ultrasonic liquid level sensing systems
|
TW201626126A
|
|
Low pressure fluctuation flow control apparatus and method
|