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VERSUM MAT US LLC

Overview
  • Total Patents
    756
  • GoodIP Patent Rank
    2,210
  • Filing trend
    ⇧ 47.0%
About

VERSUM MAT US LLC has a total of 756 patent applications. It increased the IP activity by 47.0%. Its first patent ever was published in 2002. It filed its patents most often in EPO (European Patent Office), United States and Republic of Korea. Its main competitors in its focus markets semiconductors, basic materials chemistry and surface technology and coating are VERSUM MATERIALS US LLC, EUGENUS INC and XIAO MANCHAO.

Patent filings per year

Chart showing VERSUM MAT US LLCs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Lei Xinjian 235
#2 Xiao Manchao 153
#3 O'Neill Mark Leonard 118
#4 Shi Xiaobo 107
#5 Zhou Hongjun 78
#6 Liu Wen Dar 72
#7 Vrtis Raymond Nicholas 66
#8 Macdonald Matthew R 64
#9 Lee Yi-Chia 60
#10 Wang Meiliang 60

Latest patents

Publication Filing date Title
WO2021081102A1 High oxide removal rates shallow trench isolation chemical mechanical planarization compositions
WO2021076676A1 Etching composition and method for euv mask protective structure
WO2021067147A1 Photoresist remover
WO2021067151A1 Low dishing copper chemical mechanical planarization
WO2021067150A1 Etching composition and method for selectively removing silicon nitride during manufacture of a semiconductor device
WO2021061922A1 Compositions for removing etch residues, methods of using and use thereof
US2021017198A1 Organoamino-Functionalized Cyclic Oligosiloxanes For Deposition Of Silicon-Containing Films
WO2021061591A1 With-in die non-uniformities (wid-nu) in planarization
WO2021050798A1 Monoalkoxysilanes and dialkoxysilanes and dense organosilica films made therefrom
WO2021050659A1 Monoalkoxysilanes and dense organosilica films made therefrom
WO2021050452A1 Formulation for deposition of silicon doped hafnium oxide
WO2021050368A1 Compositions and methods using same for non-conformal deposition of silicon-containing films
WO2021034641A1 Silicon compounds and methods for depositing films using same
WO2021016553A1 Compositions comprising silacycloalkanes and methods using same for deposition of silicon-containing film
WO2021011515A1 Compositions for removing etch residues, methods of using and use thereof
WO2020257550A1 Compositions and methods using same for deposition of silicon-containing film
WO2020257103A1 Cleaning composition for semiconductor substrates
WO2020252272A1 Liquid compositions for selectively removing polysilicon over p-doped silicon and silicon-germanium during manufacture of a semiconductor device
WO2020247237A1 New group v and vi transition metal precursors for thin film deposition
WO2020236994A1 Compositions and methods using same for thermal deposition silicon-containing films