Learn more

UNAXIS DEUTSCHLAND HOLDING

Overview
  • Total Patents
    48
About

UNAXIS DEUTSCHLAND HOLDING has a total of 48 patent applications. Its first patent ever was published in 1991. It filed its patents most often in Germany, EPO (European Patent Office) and United States. Its main competitors in its focus markets surface technology and coating, electrical machinery and energy and chemical engineering are ASCENTOOL INC, STOWELL MICHAEL W and TANGO SYSTEMS INC.

Patent filings in countries

World map showing UNAXIS DEUTSCHLAND HOLDINGs patent filings in countries

Patent filings per year

Chart showing UNAXIS DEUTSCHLAND HOLDINGs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Teschner Goetz 9
#2 Szczyrbowski Joachim 7
#3 Bruch Juergen 5
#4 Liehr Michael 4
#5 Zejda Jaroslav 3
#6 Henrich Juergen 3
#7 Koenig Michael 3
#8 Schaefer Lothar 2
#9 Baehr Martin 2
#10 Marquardt Dietmar 2

Latest patents

Publication Filing date Title
JP2005124396A Manufacturing method of member
DE10322935A1 Separating wall having a gap for dividing process chambers of a vacuum deposition installation comprises measuring devices, evaluating devices, and adjusting devices
DE19745771A1 Method for operating a high-power electron beam
DE19651811A1 Device for covering a substrate with thin layers
DE19631407A1 Device for plasma-chemical deposition of polycrystalline diamond
DE19610012A1 A method for stabilizing a working point in reactive sputtering in an oxygen-containing atmosphere
DE4427984A1 Device for feeding in and out of workpieces in a coating chamber
DE4418906A1 Process for coating a substrate and coating system for carrying it out
DE4407909A1 Method and device for the continuous or quasi-continuous coating of spectacle lenses
DE4341635A1 Vacuum coating system
DE4338535A1 Extractor ion gauge
DE4332674A1 Device for locking a flat, preferably circular disk-shaped substrate on the substrate plate of a vacuum coating system
DE4326100A1 Method and apparatus for coating substrates in a vacuum chamber, with means for detecting and suppressing unwanted arcing
DE4321639A1 Plasma-assisted, chemical vacuum coating system
DE4314251A1 Method and device for evaporating absorbent thin layers on a substrate
DE4309717A1 Process for evaporating a layer
DE4306611A1 Device for the surface treatment of substrates by the action of plasma
DE4305750A1 Device for holding flat, circular disk-shaped substrates in the vacuum chamber of a coating or etching system
DE4237971A1 Vacuum pump with converter
DE4213763A1 Process for evacuating a vacuum chamber and a high vacuum chamber, and high vacuum system for carrying it out