MUSTANG VACUUM SYSTEMS INC has a total of 12 patent applications. Its first patent ever was published in 2011. It filed its patents most often in United States, EPO (European Patent Office) and Republic of Korea. Its main competitors in its focus markets surface technology and coating and electrical machinery and energy are SHM S R O, ACERDE and MINEGISHI TOMOHIRO.
# | Country | Total Patents | |
---|---|---|---|
#1 | United States | 3 | |
#2 | EPO (European Patent Office) | 2 | |
#3 | Republic of Korea | 2 | |
#4 | WIPO (World Intellectual Property Organization) | 2 | |
#5 | Brazil | 1 | |
#6 | China | 1 | |
#7 | Hong Kong | 1 |
# | Industry | |
---|---|---|
#1 | Surface technology and coating | |
#2 | Electrical machinery and energy |
# | Technology | |
---|---|---|
#1 | Coating metallic material | |
#2 | Electric discharge tubes |
# | Name | Total Patents |
---|---|---|
#1 | Choquette Robert | 6 |
#2 | Dickey Aaron | 6 |
#3 | Egle Lawrence | 6 |
#4 | Choquette Robert W | 5 |
#5 | Greenwell Richard | 4 |
#6 | Choquette Richard | 1 |
#7 | Robert W Choquette | 1 |
Publication | Filing date | Title |
---|---|---|
US2016333463A1 | Cylindrical Rotating Magnetron Sputtering Cathode Device and Method of Depositing Material Using Radio Frequency Emissions | |
EP3308383A1 | Apparatus and method for the evaporation and deposition of materials using a rope filament | |
WO2013028977A2 | Apparatus and method for the evaporation and deposition of materials | |
US2013008777A1 | Cylindrical Rotating Magnetron Sputtering Cathode Device and Method of Depositing Material Using Radio Frequency Emissions |