|
WO2021030336A1
|
|
Ultra high purity conditions for atomic scale processing
|
|
US2016358763A1
|
|
Hermetically sealed magnetic keeper cathode
|
|
US2016099135A1
|
|
Rectangular Hollow Sputter Source and Method of use Thereof
|
|
US2017175251A1
|
|
Surrounding field sputtering source
|
|
US2005147753A1
|
|
Material deposition system and a method for coating a substrate or thermally processing a material in a vacuum
|
|
WO0177405A1
|
|
Magnetron sputtering source with improved target utilization and deposition rate
|
|
EP1246951A1
|
|
Method and apparatus for coating a substrate in a vacuum
|
|
US6830626B1
|
|
Method and apparatus for coating a substrate in a vacuum
|
