STOWELL MICHAEL W has a total of 15 patent applications. Its first patent ever was published in 2005. It filed its patents most often in United States. Its main competitors in its focus markets electrical machinery and energy, surface technology and coating and telecommunications are MUSTANG VACUUM SYSTEMS INC, SHM S R O and ASCENTOOL INC.
# | Country | Total Patents | |
---|---|---|---|
#1 | United States | 15 |
# | Industry | |
---|---|---|
#1 | Electrical machinery and energy | |
#2 | Surface technology and coating | |
#3 | Telecommunications | |
#4 | Semiconductors | |
#5 | Optics | |
#6 | Chemical engineering | |
#7 | Machines |
# | Technology | |
---|---|---|
#1 | Electric discharge tubes | |
#2 | Coating metallic material | |
#3 | Plasma technique | |
#4 | Unspecified technologies | |
#5 | Special electric heating or lighting | |
#6 | Optical systems | |
#7 | Antennas | |
#8 | Semiconductor devices |
# | Name | Total Patents |
---|---|---|
#1 | Stowell Michael W | 15 |
#2 | Liehr Michael | 3 |
#3 | Dieguez-Campo Jose M | 2 |
#4 | Gaertner Harald | 1 |
#5 | Dieguez-Campo Jose Manuel | 1 |
#6 | Hofmann Ralf | 1 |
#7 | Foad Majeed A | 1 |
#8 | Aderhold Wolfgang R | 1 |
#9 | Ruske Manfred | 1 |
#10 | Moffatt Stephen | 1 |
Publication | Filing date | Title |
---|---|---|
US2009277778A1 | Microwave rotatable sputtering deposition | |
US2008110752A1 | System and method for high-energy sputtering using return conductors | |
US2008113107A1 | System and method for containment shielding during pecvd deposition processes | |
US2007190808A1 | Low-k dielectric layers for large substrates | |
US2008113108A1 | System and method for control of electromagnetic radiation in pecvd discharge processes | |
US2007095281A1 | System and method for power function ramping of microwave liner discharge sources | |
US2006278521A1 | System and method for controlling ion density and energy using modulated power signals | |
US2006278524A1 | System and method for modulating power signals to control sputtering |